MULTI-CHAMBER TYPE SUBSTRATE PROCESS UNIT HAVING IMPROVED SUBSTRATE CARRIER DEVICE

摘要

PURPOSE: A multi-chamber type substrate process unit having an improved substrate carrier device is provided to prevent the collision between a substrate and an inner wall of a process chamber due to a twisting effect of a fork arm by inspecting a position of the fork arm before a process chamber. CONSTITUTION: A multi-chamber type substrate process unit having an improved substrate carrier device includes a carrier chamber and a plurality of process chambers. The carrier chamber has a plurality of sides and includes a substrate carrier robot(10). The process chambers are connected to the sides of the carrier chamber. The substrate carrier robot is formed with a rotary shaft(11), a plurality of arms(13,15), and a fork arm(17). The rotary shaft(11) is installed at a center part of a lower wall of the carrier chamber. The rotary shaft is rotated by a driving unit. The arms(13,15) are operated by the rotation of the rotary shaft. The fork arm is installed at one end of the arms to capture a substrate. A fork arm rotation position sensor unit(20) is installed around a connection shaft of the fork arm(17) to sense an abnormal state of rotation of the fork arm.