| 摘要 |
PURPOSE: A polishing machine is provided to evenly apply the pressure of an upper polishing plate to each workpiece accommodated in a through hole of a carrier. CONSTITUTION: A polishing machine comprises an upper polishing plate(10) for polishing upper faces of work pieces(W); a lower polishing plate(12) for polishing lower faces of the work pieces; and a unit(24) for rotating at least one of the polishing plates; plural carriers(26) provided around the center of gravity of the upper polishing plate and sandwiched between the polishing plates; units(30,40) for independently performing circular motion or swing motion of the carriers without revolving on axes; and units(96,98) for controlling the units for independently performing circular motion or swing motion of the carriers. Each of the carriers has a through-hole, in which the work piece is accommodated. The centers of gravity of the work pieces, which are held by the carriers, are simultaneously moved close to the center of gravity of the upper polishing plate and simultaneously moved away therefrom, and moving distances of the centers of gravity of the work pieces are equal during the circular motion or the swing motion of the carriers. |
