发明名称 PLATING METHOD
摘要 PURPOSE: Compositions and methods for electroless deposition of bright silver layers of uniform thickness are provided. CONSTITUTION: The immersion silver plating bath composition comprises one or more sources of silver ions, water, one or more complexing agents and one or more carboxylic acid-substituted nitrogen-containing heterocyclic compounds, wherein the bath is free of ammonia and ammonium ions, wherein the bath has a pH of more than or equal to 7, wherein the bath has a pH of more than or equal to 8.5, wherein the carboxylic acid-substituted nitrogen-containing heterocyclic compound is chosen from picolinic acid, quinolinic acid, nicotinic acid, fusaric acid, isonipecotic acid, nipecotic acid, pyridine dicarboxylic acid, piperazine carboxylic acid, pyrrole carboxylic acid and pipecolinic acid, wherein the carboxylic acid-substituted nitrogen-containing heterocyclic compound comprises a nitrogen-containing heterocyclic moiety chosen from pyridine, piperidine, piperazine, pyrrole, morpholine, pyrrolidine, triazole, and imidazole, wherein at least one complexing agent is a multidentate ligand, and wherein at least one complexing agent is chosen from cyanide, pyridine; amino acids having from 2 to 10 carbon atoms; polycarboxylic acids; amino acetic acids; pyridine carboxylic acid and pyridine dicarboxylic acid; alkylene polyamine polyacetic acids, polyamines; citrates; tartrates; N,N-di-(2-hydroxyethyl)glycine; gluconates; lactates; crown ethers; cryptands; polyhydric compounds; heteroaromatic compounds; thio-containing ligands and amino alcohols. The method of depositing a layer of silver on a substrate comprises the step of contacting a substrate having a layer of a metal that is less electropositive than silver with an immersion silver plating bath comprising one or more sources of silver ions, water, one or more complexing agents and one or more carboxylic acid-substituted nitrogen-containing heterocyclic compounds, wherein the bath is free of ammonia and ammonium ions.
申请公布号 KR20040019968(A) 申请公布日期 2004.03.06
申请号 KR20030059742 申请日期 2003.08.28
申请人 ROHM AND HAAS ELECTRONIC MATERIALS L.L.C. 发明人 RZEZNIK MARIA ANNA;JACQUES DAVID L.
分类号 C23C18/44;C23C18/42;C23C18/54;H05K3/24;(IPC1-7):C23C18/42 主分类号 C23C18/44
代理机构 代理人
主权项
地址