| 摘要 |
PURPOSE: A sputtering target is provided which suppresses flake phenomena of alien substances by treating the surface of the redeposition region more roughly compared to the surface of the erosion region in erosion region and redeposition region formed on the surface of target. CONSTITUTION: In the surface of a sputtering target(10') that is divided into erosion region and redeposition region by magnet unit(12) adhered to the rear side of the target, the sputtering target is characterized in that roughness of the surface of the erosion region(22') and redeposition region(24) is varied according to the respective regions, wherein roughness of the surface of the redeposition region is relatively higher than that of the surface of the erosion region, wherein sand is injected onto the surface of the redeposition region to obtain a higher roughness, and wherein a material having strong force of adhesion with sputtering particles is spray coated on the surface of the redeposition region to obtain a higher roughness.
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