| 摘要 |
PURPOSE: Provided is a susceptor plate for batch-processing a silicon wafer at high temperatures. CONSTITUTION: A susceptor plate(100) is so designed as to store one wafer. A plurality of such susceptor plates(100), each mounted with a wafer, are arranged vertically at intervals in a susceptor plate holder during batch processing or furnace processing. The susceptor plate(100) can support the wafer by the entire surface from below, and has an opening(130) of a diameter up to 20 mm within a support face(110). A projection is suppressed to be a minimum. Consequently, the susceptor plat(100) can prevent the wafer from warping beyond the plastic deformation point. In order to remove projections exceeding a prescribed height, the support face(110) is polished or ground. Regarding the processing temperature, a heat-up speed of the susceptor plate(100) can be increased, without plastic deformation of the wafer or attaching thereof to the susceptor plate.
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