METHOD FOR FABRICATING ARRAY SUBSTRATE OF LCD

摘要

PURPOSE: A method for fabricating an array substrate of an LCD is provided to remove an oxide film from a protecting film on TFTs for reducing the off-current in the TFTs, thereby improving the reliability of the TFTs. CONSTITUTION: A method for fabricating an array substrate of an LCD includes the steps of forming TFTs(10) on a transparent insulating substrate, and depositing a protecting film(13) on the entire surface of the substrate to cover all the TFTs. Via holes are formed for exposing source electrodes(11a) of the TFTs by etching the protecting film. An ITO metal film is deposited on the protecting film to bury the via holes. Pixel electrodes(15) are formed by patterning the ITO metal film to contact the source electrodes of the TFTs via the via holes. An oxide film(20) partially formed on the protecting film on the TFTs is removed by wet etching, wherein an etchant added by HF of 1-10% is used.