发明名称 MASK FORMING METHOD AND REMOVING METHOD, AND SEMI-CONDUCTOR DEVICE, ELECTRIC CIRCUIT, DISPLAY MODULE, COLOR FILTER AND LIGHT EMITTING ELEMENT PRODUCED BY THE TECHNIQUES
摘要 <p>A mask forming method that can reduce manufacturing cost is disclosed. The method forms a mask on the surface of a member to be processed in order to form a desired pattern using liquid material for patterning. The method also includes applying resist to the entire surface of the member to be processed, drying the applied resist, patterning by removing the resist in a pattern-formation area using photolithography, and heating the resist.</p>
申请公布号 KR20040019278(A) 申请公布日期 2004.03.05
申请号 KR20037010321 申请日期 2003.08.05
申请人 发明人
分类号 H01L21/32;C25D5/02;C25D7/12;H01L21/027;H01L21/288;H01L21/311;H01L21/312;H01L21/768 主分类号 H01L21/32
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