| 摘要 |
Disclosed is a fabric rise composition comprising a) 0.1 to 10 % by weight of a UV absorber of formula (1), wherein U is a radical of a UV absorber selected from hydroxyphenyl-benztriazole, hydroxyphenyl-triazine and benzophenone; A direct bond; C1-C6alkylen; C1-C6alkyliden; or a group of formula (1a); Y direct bond; or the group -CO-; -COO-; -OOC-; -CO-N(R')-; -(R')N-CO-; -SO2-N(R')-; -R(R')N-SO2; a group of formula (1b); (1c); (1d); or (1e); B direct bond; C2-C6alkylene or C2-C6alkylidene which is substituted by OH and which can be interrupted by -O- or by one or two N<+>X<->(R')2-i; or is a group of formula (1g), or (h); or the group (2) is a saturated or unsaturated mononuclear or trinuclear N-heterocyclic radical containing 1-4 N-atoms as ring members, at least one of which is quarternized; R1, R2 and R3 independently from each other are hydrogen; C1-C8alkyl; or C1-C8alkyl which is substituted by 1 -COOR'' group or by 1 to 3 OH groups, C2-C8hydroxyalkyl which is interrupted by one or more -O- groups, -(C1-C8)alkylene-COO<->, -(C1-C8)akylidene COO<->, -(C2-C8)alkylidene-SO3- each of which is substituted by one OH group; C3-C5alkenyl; C5-C7cycloalkyl; phenyl; tolyl; benzyl; or glycidyl; or R1 together with R2 and if appropriate with R3 and together with the N<+>-atom to which they are attached, form a N-heterocyclic radical which can contain 1-3 N-atoms or one O-atom as ring members; R' is hydrogen; C1-C4alkyl or C2-C3 hydroxyalkyl; R'' is hydrogen; or C1-C4alkyl and X' if not present in R<subs
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