| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem that the prior arts compose an entire apparatus while including peripheral functions other than a film-forming function such as a load lock chamber or a substrate transfer chamber, and consequently that the whole apparatus becomes large, a facility cost increases, maintenance, model change and new model launching take much time, and flexibility to the production quantity is poor. SOLUTION: An apparatus for film-forming treatment has at least two groups of film-forming chambers 1 which can perform film-forming treatment simultaneously for several substrates 2 to be film-formed, wherein components in the film-forming chamber 1 are substantially similarly configured and arranged with respect to the substrates 2 to be film-formed; and further has at least one or more preliminary vacuum chambers 10 provided in an exhaust path leading to an exhaust means 11 for exhausting the air from the film-forming chamber 1. A small apparatus which can complete all processes of import, export, vacuum drawing and film-forming treatment in one unit, is realized by using the above apparatus for film-forming treatment. COPYRIGHT: (C)2004,JPO
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