发明名称 |
Method and apparatus for supplying a source gas |
摘要 |
A method for supplying a source gas to a processing chamber for forming a film on a substrate in the processing chamber includes: heating a carrier gas; bubbling the heated carrier gas in a liquid source disposed in a container to form a vapor source; and supplying a source gas including the vapor source and the heated carrier gas into the processing chamber for forming the film.
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申请公布号 |
US2004041286(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
US20030431981 |
申请日期 |
2003.05.08 |
申请人 |
LEE JAI-DONG;HWANG KI-HYUN;KO CHANG-HYUN |
发明人 |
LEE JAI-DONG;HWANG KI-HYUN;KO CHANG-HYUN |
分类号 |
H01L21/205;C23C16/448;(IPC1-7):B01F3/04 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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