Sample processing apparatus and sample processing system

摘要

It is an object of the invention to provide a vacuum processing device and a vacuum processing system capable of improving the accuracy for the function of estimating the result of processing of samples based on the monitored values for the processing state of the samples, improving the forecasting accuracy and thus improving the yield of products. The system comprises a function of monitoring processing parameters for samples, a function of estimating the processing characteristics of the samples based on the monitored parameters, a function of conducting communication with a measuring device for measuring the processing state of the samples after processing and a function of updating the measuring conditions by the measuring device in accordance with the processing characteristics of the samples estimated from the information by monitoring.