| 摘要 |
The invention relates to a tube magnetron in a vacuum coating plant, provided with a hollow rotating tube target arrangement and a magnet system, comprising two magnetic field maxima in cross-section arranged in the axial longitudinal direction of the tube target arrangement and therein. The magnetic field passes through the tube target arrangement and the tube target arrangement comprises target plates running longitudinally which are fixed to a target support. The aim of the invention is to achieve an improved process uniformity as an essential condition for a high layer quality on the substrate, in particular on the use of target plates made from ceramics for example, ITO, zinc oxide, silicon and other ceramic, ceramic-like and/or high-melting materials. Said aim is achieved whereby the target plates are arranged adjacent to each other to form a polygon in cross-section. |
