发明名称 METHOD, ARTICLE AND COMPOSITION FOR LIMITING PARTICLE AGGREGATION IN A MASK DEPOSITED BY A COLLOIDAL SUSPENSION
摘要 A method, composition, and article for patterning and depositioning a substrate (12) employing a colloid suspension (10) to eliminate aggregations of colloid particles (18) in the substrate (12). The colloidal suspension (10) may include a plurality of colloidal particles (18) in a suspension medium which may comprise deionized water, a resist such as photoresist, and a solvent.
申请公布号 AU2000240799(A1) 申请公布日期 2004.03.04
申请号 AU20000240799 申请日期 2000.04.06
申请人 WELLS, DAVID, H.;HOFFMAN, JAMES, J.;MICRON TECHNOLOGY, INC. 发明人 DAVID, H. WELLS;JAMES, J. HOFFMAN
分类号 C23C14/04;G03F1/00 主分类号 C23C14/04
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