发明名称 |
METHOD, ARTICLE AND COMPOSITION FOR LIMITING PARTICLE AGGREGATION IN A MASK DEPOSITED BY A COLLOIDAL SUSPENSION |
摘要 |
A method, composition, and article for patterning and depositioning a substrate (12) employing a colloid suspension (10) to eliminate aggregations of colloid particles (18) in the substrate (12). The colloidal suspension (10) may include a plurality of colloidal particles (18) in a suspension medium which may comprise deionized water, a resist such as photoresist, and a solvent. |
申请公布号 |
AU2000240799(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
AU20000240799 |
申请日期 |
2000.04.06 |
申请人 |
WELLS, DAVID, H.;HOFFMAN, JAMES, J.;MICRON TECHNOLOGY, INC. |
发明人 |
DAVID, H. WELLS;JAMES, J. HOFFMAN |
分类号 |
C23C14/04;G03F1/00 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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