| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus enlarged in application scope and improved in production efficiency, capable of stable and uninterrupted plasma formation while maintaining uniformity for the large diameter throughout wide ranges of gas kinds, pressures, and densities. <P>SOLUTION: In the plasma generating apparatus into whose decompressed chamber electromagnetic waves are introduced through a dielectric window, at least two antenna elements are provided and arranged in rotational symmetry. One end of each of the antenna elements is grounded, and the other end of the same is supplied with a power equal or similar to a high-frequency power source in terms of phase. <P>COPYRIGHT: (C)2004,JPO |
