发明名称 SILICON NITRIDE SINTERED BODY AND ITS MANUFACTURING PROCESS
摘要 <P>PROBLEM TO BE SOLVED: To provide a dense silicon nitride sintered body with few pores and glass phases, few oxygen impurities and lattice defects that cause scattering within a silicon nitride lattice and a higher heat conductivity sufficient for achieving an excellent heat dissipation required for a heat dissipation substrate used under a condition of a high energy density. <P>SOLUTION: The silicon nitride sintered body comprises a composition containing, by mass, 85-99% silicon nitride and 1-15% total of oxides or oxynitrides of at least one metal element chosen from Mg, Ca, Y, La, Nd, Sm and Yb calculated in terms of their oxides, and an Al atom content of &le;1.0% calculated in terms of oxides. The sintered body is composed of silicon nitride particles containing deposits therein. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004067405(A) 申请公布日期 2004.03.04
申请号 JP20020225578 申请日期 2002.08.02
申请人 NISSAN MOTOR CO LTD 发明人 OKADA AKIRA
分类号 C04B35/584 主分类号 C04B35/584
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