发明名称 SYSTEM FOR CONTROLLING MASK FOR EXPOSURE
摘要 <p><P>PROBLEM TO BE SOLVED: To eliminate a mistake in verification of a mask for exposure to be discontinued and to reliably perform recovery of the mask for exposure to be abolished and deletion of production data and information on the mask, with respect to a system for controlling masks for exposure used in control of masks for exposure necessary for production of semiconductor chips. <P>SOLUTION: A reticle class table in which reticles have been classified every variety of semiconductor chips is updatably held in a system, and in the reticle class table, a trial production flag, a mass production flag or a discontinuation flag can be put every reticle class as information on service conditions. On the basis of the reticle class table, extraction of reticles to be discontinued, discharge of the reticles to be discontinued from a stocker and deletion of production data and information on the reticles to be discontinued are automatically performed by executing a prescribed program. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004070026(A) 申请公布日期 2004.03.04
申请号 JP20020229571 申请日期 2002.08.07
申请人 FUJITSU LTD 发明人 MAEDA RYUJI
分类号 G03F1/68;G06Q50/00;G06Q50/04;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/68
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