发明名称 FOUNDATION GARMENT
摘要 PROBLEM TO BE SOLVED: To provide a foundation garment improved in productivity and avoiding waste of original fabric for bias tapes conventionary used while maintaining touch feeling at the sewn part of the reverse surface of the foundation garment to be favorable to the same extent as that in using the conventional bias tapes. SOLUTION: The foundation garment 10 is formed by the following processes: setting at least two kinds of fabrics 11a, 11b, 12, 13, 14 and 15 including elastic fabrics and ordinary fabrics into a combination, and sewing up the fabrics to join them together. Backing tapes 16, 17 covering the sewn-up part along at least one of the sewn-up parts exposed at the reverse side are sewn up to the foundation garment. The backing tapes 16, 17 comprise flat braids each braided into such a width as to cover the sewn-up part. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004068183(A) 申请公布日期 2004.03.04
申请号 JP20020226777 申请日期 2002.08.05
申请人 INOUE RIBON KOGYO KK;FUJISAWA HOKAO 发明人 INOUE TAKAHIRO;FUJISAWA HOKAO
分类号 A41D27/24;A41C1/06;A41C1/12;A41C3/00;A41C3/12;D04C1/06;(IPC1-7):A41C1/12 主分类号 A41D27/24
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