发明名称 Method and apparatus for simultaneously removing multiple conductive materials from microelectronic substrates
摘要 A method and apparatus for simultaneously removing conductive materials from a microelectronic substrate. A method in accordance with one embodiment of the invention includes contacting a surface of a microelectronic substrate with an electrolytic liquid, the microelectronic substrate having first and second different conductive materials. The method can further include controlling a difference between a first open circuit potential of the first conducive material and a second open circuit potential of the second conductive material by selecting a pH of the electrolytic liquid. The method can further include simultaneously removing at least portions of the first and second conductive materials by passing a varying electrical signal through the electrolytic liquid and the conductive materials. Accordingly, the effects of galvanic interactions between the two conductive materials can be reduced and/or eliminated.
申请公布号 US2004043582(A1) 申请公布日期 2004.03.04
申请号 US20020230602 申请日期 2002.08.29
申请人 CHOPRA DINESH 发明人 CHOPRA DINESH
分类号 B23H5/08;C25F3/02;C25F7/00;H01L21/321;H01L21/326;H01L21/768;H01L21/78;H01L21/8238;(IPC1-7):H01L21/78 主分类号 B23H5/08
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