发明名称 3-D spiral stacked inductor on semiconductor material
摘要 A parallel spiral stacked inductor and manufacturing method therefore is provided. A substrate has a plurality of turns in a plurality of levels, the plurality of turns having a center proximate and a center distal ends. A first plurality of vias connecting the center proximate ends of the plurality of turns and a second plurality of vias connecting the center distal ends of the plurality of turns. A first connecting portion connects to the center proximate ends of the plurality of turns and a second connecting portion connecting to the center distal end of the plurality of turns. A dielectric material contains the inductor.
申请公布号 US2004041234(A1) 申请公布日期 2004.03.04
申请号 US20020131336 申请日期 2002.09.04
申请人 SIA CHOON-BENG;YEO KIAT SENG;CHU SHAO-FU SANFORD;NG CHENG YEOW;CHEW KOK WAI;GOH WANG LING 发明人 SIA CHOON-BENG;YEO KIAT SENG;CHU SHAO-FU SANFORD;NG CHENG YEOW;CHEW KOK WAI;GOH WANG LING
分类号 H01F41/04;H01F17/00;H01L21/02;H01L27/08;(IPC1-7):H01L29/00 主分类号 H01F41/04
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