发明名称 SPUTTERING TARGET, SINTERED COMPACT AND ELECTRICALLY CONDUCTIVE FILM PRODUCED BY UTILIZING THEM
摘要 <P>PROBLEM TO BE SOLVED: To provide an electrically conductive film which has excellent transparency and has a work function higher than that of the conventional one, and to provide an EL (electro luminescence) element or the like in which the injection efficiency of positive holes is improved by using the same electrically conductive film. <P>SOLUTION: The sintered compact additionally containing one or more selected from hafnium oxide, tantalum oxide, lanthanoide based oxide and bismuth oxide in a sintered compact containing one or more of metals selected from indium oxide, zinc oxide and tin oxide as components is produced. A backing plate is fitted to the sintered compact to compose the sputtering target. Using the sputtering target, the electrically conductive film is produced on a prescribed substrate by sputtering. The electrically conductive film realizes a high work function while maintaining transparency to the level equal to that in the conventional one. The EL element or the like in which the injection efficiency of positive holes is improved can be realized by using the same electrically conductive film. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004068054(A) 申请公布日期 2004.03.04
申请号 JP20020226429 申请日期 2002.08.02
申请人 IDEMITSU KOSAN CO LTD 发明人 INOUE KAZUYOSHI
分类号 C04B35/00;C23C14/08;C23C14/34;H01B5/14 主分类号 C04B35/00
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