发明名称 FACE MASK SUPPORT
摘要 A face mask support for continuous positive airway pressure comprises a hemispheric cap with biasing means support at the medial line of the head. The circumferential edge of the cap extends from the high forehead to below the inion protrusion at the nape of the neck. A biasing means which is preferably of length of spring steel is formed so as to extend from the biasing means support to form a loop around a face mask. The hemispheric cap is formed of an elastic material or is provided with adjustibility and the biasing means may be adjusted to accommodate facial configurations and to vary the pressure with which the face mask is apposed to the face. In an alternative embodiment, the support is open and is comprised of a circumferential band extending from the high forehead to below the inion protrusion at the nape of the neck and a medial band extending along the medial line of the head and connecting to the circumferential band at the high forehead and below the inion protrusion. The medial band may be bifurcated at the inion area and each arm of the medial band is connected to the circumferential band near the medial line of the head.
申请公布号 WO2004018014(A2) 申请公布日期 2004.03.04
申请号 WO2003US26082 申请日期 2003.08.19
申请人 BORDEWICK, STEVEN, S.;QUINN, STEPHEN, H. 发明人 BORDEWICK, STEVEN, S.;QUINN, STEPHEN, H.
分类号 A61M16/06 主分类号 A61M16/06
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