| 发明名称 |
APPARATUS FOR DEPOSITING FILM ON SURFACE OF CAPILLARY AND FILM DEPOSITION METHOD USING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus having excellent economic efficiency and mass productivity when a film is formed by a vapor phase process on the surfaces of capillaries and to provide a film deposition method using the apparatus. <P>SOLUTION: The apparatus for film deposition on the surfaces of the capillaries has functions to dispose a prescribed number of capillaries being substrates in a film deposition position, to rotate each small tube on its axis during film deposition and to transport the capillaries after film deposition to a prescribed location. <P>COPYRIGHT: (C)2004,JPO |
| 申请公布号 |
JP2004066084(A) |
申请公布日期 |
2004.03.04 |
| 申请号 |
JP20020227667 |
申请日期 |
2002.08.05 |
| 申请人 |
NISSAN MOTOR CO LTD |
发明人 |
SAWADA YUKITAKA;KUSHIBIKI KEIKO;YAMANAKA MITSUGI |
| 分类号 |
B01J19/00;C23C14/50;H01M8/02;H01M8/12 |
主分类号 |
B01J19/00 |
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