发明名称 |
Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice |
摘要 |
A production method for a projection optical system capable of efficiently manufacturing a projection optical system having excellent optical characteristics with residual aberration favorably suppressed, the method comprising: a step for assembling a projection optical system; a step for measuring wavefront aberration; a step for calculating respective components of wavefront aberration by making the measurement result correspond to a Zernike function; and first and second adjusting steps for adjusting optical members in the projection optical system corresponding to respective components of the wavefront aberration obtained in the wavefront aberration calculating step. Prior to the second adjusting step, a performance prediction step for predicting performance after adjustment in the second adjusting step; and a judging step for judging based on the performance predicted in the performance prediction step are implemented.
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申请公布号 |
US2004042094(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
US20030451851 |
申请日期 |
2003.06.26 |
申请人 |
MATSUYAMA TOMOYUKI |
发明人 |
MATSUYAMA TOMOYUKI |
分类号 |
G02B7/02;G02B27/00;G03F7/20;(IPC1-7):G02B7/02 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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