发明名称 |
SUBSTRATE PROCESSING SYSTEM |
摘要 |
A system comprising a first robotic arm assembly for capturing and releasing a semiconductor wafer, a second robotic arm for capturing and releasing an interleaf, and a controller for actuation of the first and second robotic arms, the first and second robotic arms operating substantially simultaneously. At least one robotic arm can include a transfer arm, which includes a counterweight attached to the first end of the transfer arm and an end effector attached to the second end of the transfer arm. Two robotic arms permit the system to carry out the steps substantially simultaneously and therefore increase throughput significantly. |
申请公布号 |
WO2004019387(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
WO2003US26505 |
申请日期 |
2003.08.22 |
申请人 |
INTEGRATED DYNAMICS ENGINEERING, INC.;WHITCOMB, PRESTON;JAMIESON, JOHN |
发明人 |
WHITCOMB, PRESTON;JAMIESON, JOHN |
分类号 |
B23Q7/04;B65G49/07;H01L21/02;H01L21/677;H01L21/683 |
主分类号 |
B23Q7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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