发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 A system comprising a first robotic arm assembly for capturing and releasing a semiconductor wafer, a second robotic arm for capturing and releasing an interleaf, and a controller for actuation of the first and second robotic arms, the first and second robotic arms operating substantially simultaneously. At least one robotic arm can include a transfer arm, which includes a counterweight attached to the first end of the transfer arm and an end effector attached to the second end of the transfer arm. Two robotic arms permit the system to carry out the steps substantially simultaneously and therefore increase throughput significantly.
申请公布号 WO2004019387(A1) 申请公布日期 2004.03.04
申请号 WO2003US26505 申请日期 2003.08.22
申请人 INTEGRATED DYNAMICS ENGINEERING, INC.;WHITCOMB, PRESTON;JAMIESON, JOHN 发明人 WHITCOMB, PRESTON;JAMIESON, JOHN
分类号 B23Q7/04;B65G49/07;H01L21/02;H01L21/677;H01L21/683 主分类号 B23Q7/04
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