发明名称 |
GAS SUPPLY SYSTEM AND TREATMENT SYSTEM |
摘要 |
<p>A treatment system capable of supplying a raw material gas produced in a material storage vessel into a treatment apparatus substantially without causing a pressure loss. A treatment system has a treatment apparatus (22) with gas jetting means (42) for jetting a predetermined raw material gas, with low vapor pressure and formed of a metallic compound material (M), in a treatment container (26) to apply a predetermined treatment to an object (W) to be treated, and a gas supply system (24) for supplying the predetermined raw material gas to the gas jetting means. The gas jetting means is a shower head portion, and the gas supply system has a gas passage (56) extending upward from the shower head portion, a material storage vessel (58) installed on the upper end portion of the gas passage and receiving the metallic compound material in its inside, and an open/close valve (60) for opening and closing the gas passage.</p> |
申请公布号 |
WO2004019399(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
WO2003JP10705 |
申请日期 |
2003.08.25 |
申请人 |
TOKYO ELECTRON LIMITED;KASAI, SHIGERU;TANAKA, SUMI;SAITO, TETSUYA;YAMAMOTO, NORIHIKO;YANAGITANI, KENICHI |
发明人 |
KASAI, SHIGERU;TANAKA, SUMI;SAITO, TETSUYA;YAMAMOTO, NORIHIKO;YANAGITANI, KENICHI |
分类号 |
C23C16/455;C23C16/448;H01L21/00;H01L21/285;H01L21/31;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/455 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|