发明名称 INTERFERENCE TYPE POSITION-MEASURING INSTRUMENT
摘要 PROBLEM TO BE SOLVED: To provide an interference type position measuring instrument having a large mounting tolerance, extremely resistant against contamination, and allowing compact structure. SOLUTION: This instrument comprises a light source 1 for emitting a light beam along an optical axis direction, a scale grating 3, scanning lattices 4.1, 4.2 arranged in a scanning plate 4, a detecting grating 5, and detection elements 6.1, 6.2, 6.3. When the scale grating 3 joined to the first body is moved relatively with respect to the light source 1 joined to the second body and the scanning lattices 4.1, 4.2, a specified spatial interference fringe pattern is formed within a detection face. The scale grating 3 divides the incident beam into two beams of a beam (+) and a beam (-). The beam (+) is made to be incident on the scanning lattice 4.1, and the beam (-) is made to be incident on the scanning lattice 4.2. The beams emitted from the scanning lattices 4.1, 4.2 are divided to three directions in the detecting grating 5 to be detected by the detection elements 6.1, 6.2, 6.3. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004069702(A) 申请公布日期 2004.03.04
申请号 JP20030286880 申请日期 2003.08.05
申请人 DR JOHANNES HEIDENHAIN GMBH 发明人 HOLZAPFEL WOLFGANG;HOERMANN MICHAEL;HUBER WALTER;HOEFER VOLKER;BENNER ULLRICH;SAENDIG KARSTEN
分类号 G01D5/26;G01D5/38;(IPC1-7):G01D5/38 主分类号 G01D5/26
代理机构 代理人
主权项
地址