发明名称 |
ILLUMINATION APPARATUS, PHASE PLATE, INSPECTION METHOD, INSPECTION APPARATUS AND METHOD FOR MANUFACTURING MASK |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an illumination apparatus and a phase plate to uniformly illuminate the object for inspection with laser light, and to provide an inspection apparatus, an inspection method and a method for manufacturing a mask by using the illumination apparatus and the phase plate. <P>SOLUTION: A rotating plate 2 rotating at a specified rotation with the output side face tilted from the optical axis is disposed in front of the laser light source 1 on the optical axis. A fixed phase plate 3 is disposed in front of the rotation plate 2, and further a condenser lens 5 is disposed in front of the fixed phase plate 3. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004070249(A) |
申请公布日期 |
2004.03.04 |
申请号 |
JP20020233254 |
申请日期 |
2002.08.09 |
申请人 |
TOSHIBA CORP |
发明人 |
OKUDA KENTARO;FUJIWARA TAKESHI |
分类号 |
G03F1/84;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/84 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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