发明名称 |
SEMICONDUCTOR DEVICE PRODUCTION EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide semiconductor device production equipment that covers leakage appropriately for performing the process by sealing spaces between respective chambers in a multiple manner, even if the leakage occurs at a minus side. SOLUTION: The semiconductor device production equipment 700 has a load lock chamber 100; at least one process chamber 300 in which the process is performed on a wafer; a transfer chamber 200 through which the wafer in the chamber 100 is passed when it is transferred into the process chamber 300; a gate 500 that intervenes between a set of adjacent chambers in the above chambers and connects the set of chambers; and a gate valve that disposed at the gate 500 and separately seals a space between each set of chambers connected by the gate 500. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004072112(A) |
申请公布日期 |
2004.03.04 |
申请号 |
JP20030286616 |
申请日期 |
2003.08.05 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
LEE SANG-HAG |
分类号 |
H01L21/677;H01L21/00;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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