发明名称 METHOD AND APPARATUS FOR THIN FILM THICKNESS MAPPING
摘要 An apparatus and method for mapping film thickness of one or more textured polycrystalline thin films. Multiple sample films of known thickness are provided. Each sample film is irradiated by x-ray at a measurement point to generate a diffraction image that captures a plurality of diffraction arcs. Texture information (i.e., pole densities) of the sample film is calculated based on incomplete pole figures collected on the diffraction image and used to correct the x-ray diffraction intensities from such sample. The corrected diffraction intensities are integrated for each sample film, and then used for constructing a calibration curve that correlates diffraction intensities with respective known film thickness of the sample films. The film thickness of a textured polycrystalline thin film of unknown thickness can therefore be mapped on such calibration curve, using a corrected and integrated diffraction intensity obtained for such thin film of unknown thickness.
申请公布号 WO2004018959(A2) 申请公布日期 2004.03.04
申请号 WO2003US25769 申请日期 2003.08.15
申请人 HYPERNEX, INC.;INTERNATIONAL BUSINESS MACHINES CORP. 发明人 KOZACZEK, KRZYSZTOF, J.;KURTZ, DAVID, S.;MORAN, PAUL, R.;MARTIN, ROGER, I.;DEHAVEN, PATRICK, W.;RODBELL, KENNETH, P.;MALHOTRA, SANDRA, G.
分类号 G01B15/02;G01N23/20 主分类号 G01B15/02
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