发明名称 VERFAHREN UND VORRICHTUNG ZUR VERBRENNUNGS CVD VON FILMEN UND BESCHICHTUNGEN
摘要 A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method.
申请公布号 DE69432175(T2) 申请公布日期 2004.03.04
申请号 DE1994632175T 申请日期 1994.03.24
申请人 GEORGIA TECH RESEARCH CORP., ATLANTA 发明人 HUNT, ANDREW T.;COCHRAN, JOE K.;CARTER, WILLIAM BRENT
分类号 C23C16/30;C23C16/40;C23C16/44;C23C16/448;C23C16/453;C23C16/513;C30B25/10 主分类号 C23C16/30
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