发明名称 COMPOSITION SENSITIVE TO VISIBLE LIGHT
摘要 A composition highly sensitive to visible light which comprises: (a) a polymer having repeating units of a structure represented by the general formula (I): (I) (wherein R<1>, R<2>, and R<3> are the same or different and each represents (un)substituted alkyl, (un)substituted aryl, or (un)substituted aralkyl, provided that R<1> and R<2> may form cycloalkyl in cooperation with the adjacent carbon atom; and R<4> represents lower alkyl); (b) a compound which generates an acid upon irradiation with visible light; and (c) a sensitizing dye. The composition is useful as a material for forming electronic circuits, lithographic printing material, etc.
申请公布号 WO2004019131(A1) 申请公布日期 2004.03.04
申请号 WO2003JP10534 申请日期 2003.08.20
申请人 KYOWA YUKA CO., LTD.;YAMAOKA, TSUGUO;ITO, KATSUHIRO;IWASAKI, TSUYOSHI;SHIMIZU, IKUO 发明人 YAMAOKA, TSUGUO;ITO, KATSUHIRO;IWASAKI, TSUYOSHI;SHIMIZU, IKUO
分类号 G03F7/039;(IPC1-7):G03F7/039;G03F7/004;C08F20/26 主分类号 G03F7/039
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