发明名称 |
COMPOSITION SENSITIVE TO VISIBLE LIGHT |
摘要 |
A composition highly sensitive to visible light which comprises: (a) a polymer having repeating units of a structure represented by the general formula (I): (I) (wherein R<1>, R<2>, and R<3> are the same or different and each represents (un)substituted alkyl, (un)substituted aryl, or (un)substituted aralkyl, provided that R<1> and R<2> may form cycloalkyl in cooperation with the adjacent carbon atom; and R<4> represents lower alkyl); (b) a compound which generates an acid upon irradiation with visible light; and (c) a sensitizing dye. The composition is useful as a material for forming electronic circuits, lithographic printing material, etc.
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申请公布号 |
WO2004019131(A1) |
申请公布日期 |
2004.03.04 |
申请号 |
WO2003JP10534 |
申请日期 |
2003.08.20 |
申请人 |
KYOWA YUKA CO., LTD.;YAMAOKA, TSUGUO;ITO, KATSUHIRO;IWASAKI, TSUYOSHI;SHIMIZU, IKUO |
发明人 |
YAMAOKA, TSUGUO;ITO, KATSUHIRO;IWASAKI, TSUYOSHI;SHIMIZU, IKUO |
分类号 |
G03F7/039;(IPC1-7):G03F7/039;G03F7/004;C08F20/26 |
主分类号 |
G03F7/039 |
代理机构 |
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地址 |
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