发明名称 Pattern forming method for carbon nanotube, and field emission cold cathode and method of manufacturing the cold cathode
摘要 Upon wet etching and thereby patterning carbon nanotubes (106) by a transfer method, a solution for dissolving a binder used in the transfer method as a solution used for the wet etching is used, and the carbon nanotubes (106) tangled with each other are rubbed off with a cloth-like substance (112) upon the wet etching. Furthermore, upon patterning the carbon nanotubes (106) using a dry etching method, a metal film or a film made of a substance resistant to damage upon the dry etching and causing no damage to the carbon nanotubes (106) when removed is used as a mask. A fine carbon nanotube pattern having an excellent flatness is formed.
申请公布号 US2004043219(A1) 申请公布日期 2004.03.04
申请号 US20030433382 申请日期 2003.05.29
申请人 ITO FUMINORI;OKADA YUKO;TOMIHARI YOSHINORI;KONUMA KAZUO;OKAMOTO AKIHIKO 发明人 ITO FUMINORI;OKADA YUKO;TOMIHARI YOSHINORI;KONUMA KAZUO;OKAMOTO AKIHIKO
分类号 H01J1/304;H01J3/02;H01J9/02;H01J29/04;H01J31/12;(IPC1-7):B32B9/00 主分类号 H01J1/304
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