发明名称 |
SPUTTERING TARGET FOR FORMING PHASE CHANGE OPTICAL DISC PROTECTIVE FILM AND OPTICAL RECORDING MEDIUM HAVING PHASE CHANGE OPTICAL DISC PROTECTIVE FILM FORMED USING THAT TARGET |
摘要 |
<p>The present invention relates to a sputtering target for forming a phase change optical disc protective film formed from a complex of chalcogenide and silicic oxide, characterized in that the sputtering target for forming a phase change optical disc protective film has, at least in the erosion portion, a texture which becomes 0.3≤A/B≤0.95 when the average length of silicic oxide in the normal line direction existing on the face within the range of -30 DEG SIMILAR +30 DEG against the normal line direction of the sputtering face is given as A and the average length in the vertical direction against the normal line is given as B. Obtained is a sputtering target formed from a complex of chalcogenide and silicic oxide capable of suppressing nodules, increasing the evenness of deposition, and improving the productivity, and which is effective in forming a phase change optical disc protective film, as well as an optical recording medium having formed thereon the phase change optical disc protective film using such a target.</p> |
申请公布号 |
EP1394284(A1) |
申请公布日期 |
2004.03.03 |
申请号 |
EP20020700587 |
申请日期 |
2002.02.15 |
申请人 |
NIKKO MATERIALS COMPANY, LIMITED |
发明人 |
YAHAGI, MASATAKA;TAKAMI, HIDEO |
分类号 |
C04B35/547;C04B35/645;C23C14/06;C23C14/34;G11B7/254;G11B7/257;G11B7/26;(IPC1-7):C23C14/34;G11B7/24 |
主分类号 |
C04B35/547 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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