发明名称 Dielectric structure and method of formation
摘要 A method for forming a dielectric structure. A first layer is formed, wherein the first layer includes a first fully cured photoimageable dielectric (PID) material. A sticker lays is nonadhesively formed on the first layer, wherein the sticker layer includes a partially cured PID material. A second layer is nonadhesively formed on the sticker layer, wherein the second layer includes a second fully cured PID material, wherein the sticker layer is nonadhesively sandwiched between the first layer and the second layer such that the sticker layer is in non-adhesive contact with the first layer and in non-adhesive contact with the second layer, and wherein the sticker layer is capable of remaining in non-adhesive contact with the first layer and the second layer until the sticker layer is subsequently subjected to additional curing.
申请公布号 US6699350(B2) 申请公布日期 2004.03.02
申请号 US20020217616 申请日期 2002.08.12
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BHATT ANILKUMAR C.;FUERNISS STEPHEN J.;MAGNUSON ROY H.;MARKOVICH VOYA R.
分类号 B32B7/04;H05K3/00;H05K3/46;(IPC1-7):B32B31/00;B05D5/12 主分类号 B32B7/04
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