发明名称 Method for identifying the cause of yield loss in integrated circuit manufacture
摘要 A method for determining the integrated circuit manufacturing operations that are the principle contributors to defect limited test yield loss comprises extracting the electrical faults for the important range of defect sizes from the layout data base; determining the signatures of the electrical response of faulted circuits to the input test stimuli; determining the statistical frequency distribution of the signatures for a fixed ratio of defect densities on the several process layers; determining the frequency distribution of the signatures observed in testing a wafer or group of wafers; and adjusting the defect densities amongst the process layers to minimize the difference between the predicted and observed frequency distributions such that the adjusted defect distribution provides a measure of the relative contribution of the process layers to yield loss.
申请公布号 US6701477(B1) 申请公布日期 2004.03.02
申请号 US20000591603 申请日期 2000.06.09
申请人 HUERISTICS PHYSICS LABORATORIES 发明人 SEGAL JULIE
分类号 G01N21/95;(IPC1-7):G01R31/28 主分类号 G01N21/95
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