发明名称 Method and apparatus for cutting and grinding single crystal SiC
摘要 The present invention comprises a metal bond grind stone having a flat plate portion 10a and a tapered portion 10b; an electrode 13 opposed to the metal bond grind stone with a gap therebetween; voltage applying means 12 for applying a direct-current pulse voltage between the metal bond grind stone and the electrode; conductive liquid supplying means 14 for supplying a conductive liquid 15 between the metal bond grind stone and the electrode; and grind stone moving means 16 for moving the metal bond grind stone in a direction orthogonal to the shaft center thereof, and an ingot 1 of a single crystal SiC is thereby cut at the tapered portion 10b of the metal bond grind stone and the cut surface is then specular-worked at the flat plate portion 10a.
申请公布号 US6699105(B1) 申请公布日期 2004.03.02
申请号 US20000530658 申请日期 2000.07.05
申请人 RIKEN;SHOWA DENKO K.K. 发明人 OHMORI HITOSHI;YAMAGATA YUTAKA;ITOH NOBUHIDE;NAGATO NOBUYUKI;YANO KOTARO;OYANAGI NAOKI
分类号 B24B7/22;B24B27/06;B24B53/00;B24D5/12;B28D5/02;(IPC1-7):B24B1/00 主分类号 B24B7/22
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