| 摘要 |
PURPOSE: A cleaning apparatus is provided to prevent a substrate from being damaged by cleaning liquid and stably maintain the surface of the substrate by cleaning the substrate or etching an oxide layer by cleaning gas. CONSTITUTION: Cleaning liquid is contained in a chemical tank. A heating tank receives the cleaning liquid from the chemical tank and applies heat to the cleaning liquid to vaporize the cleaning liquid. A storage tank(11) receives the cleaning gas from the heating tank, and maintains and stores uniform temperature and pressure. A chamber(18) receives the cleaning gas from the storage tank and cleans a glass substrate. A temperature control unit(14) controls a temperature, attached to the heating tank and the storage tank. A ventilating apparatus makes the cleaning gas flow uniformly, attached to the chamber.
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