发明名称 Method for fabricating high-purity silica glass using sol-gel processing
摘要 Disclosed is a method for fabricating high-purity silica glass using a sol-gel processing that includes the steps of: (a) mixing a deionized water with a fluorine compound and a dispersion agent to prepare an aqueous premix solution; (b) mixing the aqueous premix solution with a fumed silica; (c) mixing the resulting mixture to form a dispersed sol; (d) aging the sol at the ambient temperature to stabilize silica particles; and, (e) removing air voids from the sol and adding a gelation agent.
申请公布号 US6698054(B2) 申请公布日期 2004.03.02
申请号 US20000750510 申请日期 2000.12.28
申请人 SAMSUNG ELECTRONICS CO, LTD 发明人 OH JEONG-HYUN;LEE MI-KYUNG
分类号 B01D19/00;C01B33/18;C03B8/02;C03B19/12;C03B20/00;C03C1/00;(IPC1-7):C03B37/06;C01B33/14 主分类号 B01D19/00
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