发明名称 WAVEFRONT ABERRATION CORRECTION APPARATUS AND EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To perform wavefront aberration correction in a wavefront aberration correction apparatus even if the apparatus is disposed in a small space. SOLUTION: A wavefront aberration correction apparatus, which corrects wavefront aberration by changing a surface profile of a mirror, has a plurality of correction units for changing the surface profile of the mirror, and the correction unit has an actuator disposed on a side face of the mirror, a force applying member connected to a back of the mirror, and a force transmission mechanism for connecting the actuator with the force action member. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004064069(A) 申请公布日期 2004.02.26
申请号 JP20030173355 申请日期 2003.06.18
申请人 NIKON CORP 发明人 MARGESON CHRISTOPHER S
分类号 G02B26/06;G02B5/10;G02B7/182;G02B17/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B26/06
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