发明名称 NANOPOROUS MATERIALS AND METHODS OF FORMATION THEREOF
摘要 <p>Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores. It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomersand wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.</p>
申请公布号 WO2004017335(A1) 申请公布日期 2004.02.26
申请号 WO2002US26276 申请日期 2002.08.15
申请人 HONEYWELL INTERNATIONAL INC.;HACKER, NIGEL;LEFFERT, SCOTT;FIGGE, LISA;SPEAR, RICHARD;BEDWELL, WILLIAM;RAMOS, TERESA 发明人 HACKER, NIGEL;LEFFERT, SCOTT;FIGGE, LISA;SPEAR, RICHARD;BEDWELL, WILLIAM;RAMOS, TERESA
分类号 C08L71/10;B32B3/26;C08G65/00;C08G77/04;C08G77/12;C08G77/20;C08L83/05;H01B3/02;H01B3/30;H01B3/42;H01B3/46;H01L21/208;H01L21/316;(IPC1-7):H01B3/02 主分类号 C08L71/10
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