NANOPOROUS MATERIALS AND METHODS OF FORMATION THEREOF
摘要
<p>Low dielectric materials are described herein that comprise a plurality of pores or nanopores in addition to the ultrananopores. It is further contemplated that the low dielectric materials described herein will have a dielectric constant of less than about 3. The dielectric materials are fromed from polymer compositions, wherein the polymer compositions comprise a plurality of monomersand wherein at least one monomer comprises a radical precursor bonded to a structural precursor. Further, methods of forming dielectric materials from polymer compositions are presented. The figure shows the chemical structure for a methyl/t-butyl Low organic Content/Low Organic Siloxane Polymer.</p>
申请公布号
WO2004017335(A1)
申请公布日期
2004.02.26
申请号
WO2002US26276
申请日期
2002.08.15
申请人
HONEYWELL INTERNATIONAL INC.;HACKER, NIGEL;LEFFERT, SCOTT;FIGGE, LISA;SPEAR, RICHARD;BEDWELL, WILLIAM;RAMOS, TERESA