发明名称 METHOD AND DEVICE FOR DETERMINING INFLUENCE ONTO POLARIZATION STATE BY OPTICAL SYSTEM, AND ANALYZER
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for determining an influence onto a polarization state by an optical system, and an analyzer. SOLUTION: In this method and the device for determining the influence onto the polarization state of emitted light by the examined optical system, the emitted light of a prescribed incident polarization state is transmitted to the optical system, an outgoing polarization state is measured, the outgoing polarization state is evaluated using the incident polarization state as a reference, and the influence onto the polarization state by the optical system is determined. The analyzer of the present invention is used for the purpose herein. The influence onto the polarization state of the emitted light by the optical image-focusing system in an assignable opening is determined using the method and the device, and the determination is carried out by pupil resolution. The influence onto the polarization state of an ultraviolet ray by a projection objective lens in a micro-lithographic projection exposure device is determined, for example, as one use. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004061515(A) 申请公布日期 2004.02.26
申请号 JP20030279852 申请日期 2003.07.25
申请人 CARK ZEISS SMT AG 发明人 WEGMANN ULRICH;HARTL MICHAEL;MENGEL MARKUS;DAHL MANFRED;HAIDNER HELMUT;SCHRIEVER MARTIN;TOTZECK MICHAEL
分类号 G01J4/04;G01M11/02;G02B27/28;G03F7/20;(IPC1-7):G01M11/02 主分类号 G01J4/04
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