发明名称 |
Phototransistor device with fully depleted base region |
摘要 |
A phototransistor comprises a layer having two n-type semiconductor regions which constitute an emitter region and a collector region, and which sandwich a lightly doped p-type base region. In operating conditions the base region is completely depleted leading to punchthrough, and generation of high optical conversion gain when the phototransistor is illuminated. The base region and part of the emitter and collector regions are covered with an oxide layer. The phototransistor can be fabricated by CMOS processing technology, so very large scale integrated circuits can be fabricated comprising a large number of the phototransistors.
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申请公布号 |
US2004036146(A1) |
申请公布日期 |
2004.02.26 |
申请号 |
US20030452919 |
申请日期 |
2003.06.03 |
申请人 |
THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY |
发明人 |
WANG YUQI;LUO HAILIN;CHANG YUCHHUN;WANG JIANNONG;GE WEIKUN |
分类号 |
G01R31/26;H01L21/00;H01L21/66;H01L27/15;H01L31/11;H01L33/00;(IPC1-7):H01L27/15 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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