| 发明名称 |
Topcoat process to prevent image collapse |
| 摘要 |
The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.
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| 申请公布号 |
US2004038155(A1) |
申请公布日期 |
2004.02.26 |
| 申请号 |
US20030646806 |
申请日期 |
2003.08.25 |
| 申请人 |
SIMONS JPHN P.;MCCULLOUGH KENNETH J.;MOREAU WAYNE M.;TAFT CHARLES J. |
发明人 |
SIMONS JPHN P.;MCCULLOUGH KENNETH J.;MOREAU WAYNE M.;TAFT CHARLES J. |
| 分类号 |
G03F7/30;H01L21/027;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/30 |
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