| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a semiconductor substrate by removing hardly removable noble metals without damaging the substrate and apparatuses. SOLUTION: The method for the cleaning of a semiconductor substrate comprises the washing with a supercritical fluid composition containing carbon dioxide and a hydrocarbon expressed by general formula (1) (R1 to R5 are each independently H, a 1-5C alkyl, an alkenyl or an alkynyl). COPYRIGHT: (C)2004,JPO
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