| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition method of optical thin film and a deposition device of the optical thin film by which highly precise film thickness control to be required for an optical filter for optical communication, etc. is possible, for which noise preventing measures are unnecessary, by which sufficient measurement precision is obtained even when film thickness of a thin film can not be constantly monitored and deposition for a long period of time is stably performed. SOLUTION: In a sputtering device 11 having a deposition controller 14 for forming the thin film on a substrate 15, it is provided with a white light source 20 which irradiates light with a many wavelengths on the thin film, an instantaneous multiphotometer 21 which receives the light with the many wavelengths to be irradiated on the thin film at a state that the deposition of the thin film is interrupted during the deposition of the thin film and measures transmissivity of the thin film about the many wavelengths respectively and a computing device 22 which identifies film thickness of the thin film from a transmission spectrum of the thin film to be obtained by measurement by the photometer and deposition of the remaining film thickness is performed based on the film thickness identified by the computing device 22. COPYRIGHT: (C)2004,JPO
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