| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate inspection method for improving detection precision of a defect, and to provide a selection method of the substrate inspection method. SOLUTION: The substrate inspection method detects the defect on the basis of a plurality of detection brightness values and a plurality of comparison brightness values determined to detect diffusion light from a detection position on a substrate and a comparison position corresponding thereto with a plurality of detectors arranged in different directions under dark field illumination. The method comprises a first synthetic process for synthesizing the plurality of the detection brightness values to produce one detection brightness synthetic value; a second synthetic process for synthesizing the plurality of the comparison brightness values to produce one brightness synthetic value; and a defect judging process for judging the presence of the defect at the detection position on the basis of the detection brightness synthetic value and the comparison brightness synthetic value. COPYRIGHT: (C)2004,JPO
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