发明名称 |
WAVE FRONT ABERRATION MEASURING METHOD, WAVE FRONT ABERRATION MEASURING DEVICE, MANUFACTURING METHOD OF IMAGING OPTICAL SYSTEM AND MANUFACTURING METHOD OF EXPOSURE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a measuring method of wave front aberration wherein the whole wave front is not modulated due to a position measurement error of a part of a spot. SOLUTION: A spherical wave SW outputted from a floodlighting optical system 12 is converted into parallel beams PB by a relay lens 14 through a pinhole in a first plane 13 of this wave front aberration measuring device 11 provided on the imaging position of the floodlighting optical system 12. The parallel beams PB enter a micro-lens array 16 formed by arranging many micro-lenses two-dimensionally. The parallel beams PB are imaged by each micro-lens as secondary images on an imaging element (CCD) 17 arranged on a prescribed position. When measuring the imaging position by the imaging element and operating the wave front aberration therefrom, data satisfying a specific standard among data of the variation of a spot position are removed, and the wave front aberration is measured based on the residual data. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004061238(A) |
申请公布日期 |
2004.02.26 |
申请号 |
JP20020218647 |
申请日期 |
2002.07.26 |
申请人 |
NIKON CORP |
发明人 |
TSUKAMOTO HIROYUKI;FUJII TORU |
分类号 |
G01M11/02;G03F7/20;H01L21/027;(IPC1-7):G01M11/02 |
主分类号 |
G01M11/02 |
代理机构 |
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