发明名称 Photosensitive compositions based on polycyclic polymers
摘要 A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from O, -CH2-, and -CH2-CH2-; m is an integer from 0 to 5; and each occurrence of R<1>-R<4 >are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; -(CH2)nC(O)OR<5>; -(CH2)nC(O)OR<6>; -(CH2)nOR<6>; -(CH2)nOC(O)R<6>; -(CH2)nC(O)R<6>; -(CH2)nOC(O)OR<6>; and any combination of two of R<1>, R<2>, R<3>, and R<4 >linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
申请公布号 US2004039153(A1) 申请公布日期 2004.02.26
申请号 US20030465511 申请日期 2003.06.19
申请人 ELCE EDMUND;HIRANO TAKASHI;KROTINE JEFFREY C.;RHODES LARRY F.;GOODALL BRIAN L.;JAYARAMAN SAIKUMAR;MCDOUGALL W. CHRIS;SUN SHENLIANG 发明人 ELCE EDMUND;HIRANO TAKASHI;KROTINE JEFFREY C.;RHODES LARRY F.;GOODALL BRIAN L.;JAYARAMAN SAIKUMAR;MCDOUGALL W. CHRIS;SUN SHENLIANG
分类号 G03F7/004;C08G59/32;C08G61/02;C08G61/06;C08L101/00;G03F7/038;G03F7/32;G03F7/40;H01L21/027;(IPC1-7):C08G59/00 主分类号 G03F7/004
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