Method of producing a glass substrate for a mask blank, method of producing a mask blank, method of producing a transfer mask, method of producing a semiconductor device, glass substrate for a mask blank, mask blank, and transfer mask

摘要

In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid containing abrasive grains, and the abrasive grains include colloidal silica abrasive grains produced by hydrolysis of an organosilicon compound.