| 发明名称 |
PLASMA DISPLAY PANEL WITH A LOW K DIELECTRIC LAYER |
| 摘要 |
A plasma display panel including a low k dielectric layer (44). In one embodiment, the dielectric layer (44) is comprises a fluorine-doped silicon oxide layer such as an SiOF layer. In another embodiment, the dielectric layer (44) comprises a Black Diamond<TM> layer. In certain embodiments, a capping layer (46) such as SiN or SiON is deposited over the dielectric layer (44). |
| 申请公布号 |
WO02103742(A3) |
申请公布日期 |
2004.02.26 |
| 申请号 |
WO2002US19559 |
申请日期 |
2002.06.18 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LAW, KAM, S.;SHANG, QUANYUAN;TAKEHARA, TAKAKO;WON, TAEKYUNG;HARSHBARGER, WILLIAM, R.;MAYDAN, DAN |
| 分类号 |
H01J9/02;H01J11/12;H01J11/38 |
主分类号 |
H01J9/02 |
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